WebAnamorphic High -NA EUV Optics enables sub 8nm resolution EUVL with 26mm slit @wafer and 6’’ mask . Lens Magnification Options . Carl Zeiss SMT GmbH, Tilmann Heil et al. 2015 EUVL Symposium Maastricht October 7 th, 2015 22 Compare given NA=0.33 Isomorphic imaging vs. Anamorphic High-NA with obscuration Web目前asml是唯一可以提供euv光刻机的供应商,其出货量稳步增长,2016年出货5台、2024年出货10台、2024年出货18台、2024年出货26台,汤之上隆预计,到2024年asml将出货36台euv光刻机。 asml的euv光刻设备出货量和积压需求(来源:wikichip、asml财务报告和一些 …
High-NA EUV: Getting Closer to Industry Introduction (Keynote)
WebAug 29, 2024 · The continuation of Moore’s law demands the continuous development of EUV lithography. After the NXE:3400B scanner, currently being inserted in high-volume manufacturing (HVM), the next logical step is to increase the numerical aperture (NA) of the EUV projection optics, from 0.33 to 0.55, resulting in a high-NA EUV scanner. Looking … WebHigh-NA EUV lithography comes with a significant redesign of the optics within the scanner, allowing light with larger angles of incidence to hit the wafer – giving the system a higher … ray eckhoff
Intel Orders Second High-NA EUV Scanner: On-Track for Mass …
Webyears the current two SEMATECH 0.3 NA EUV METs have been supporting EUV resist materials readiness for a 22/16 nm half -pitch EUV introductio n [3] [14] [15] . However, a … WebEUV stands for "extreme ultraviolet" light. The light visible to humans has wavelengths between 400 and 800 nanometers. The range of ultraviolet light begins below 400 nanometers. The leading lithography process to date using "deep ultraviolet light" (DUV) operates at a wavelength of 193 nanometers. WebOct 16, 2024 · While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their activities on a EUV exposure tool with Numerical Aperture of 0.55. The purpose of this scanner, targeting an ultimate resolution of 8nm, is to extend Moore’s law throughout the next decade. A … rayec upmc.edu